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5PMNPHO1 : Photolithography - WPMNDPH9

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  • Number of hours

    • Lectures : 5.0
    • Tutorials : 5.0
    • Laboratory works : ?
    • Projects : ?
    • Internship : ?
    ECTS : 1.0

Goals

The objective of this lecture is to show an over-view of the lithography techniques used in micro-electronics industry today. Some advanced solutions for the fabrication of the future devices are also discussed.

Contact Irina IONICA

Content

  • Introduction to lithography (definitions, objectives, classifications ...)
  • Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
    - Introduction to advanced lithography techniques (e-beam, nano-imprint)


Prerequisites

some concepts of microelectronics fabrication technology

Tests

closed-book written exam, 1 hour



Additional Information

Curriculum->Master->Semester 9
Curriculum->Master PhSem->Semester 9
Curriculum->IPhy->Semester 9
Curriculum->Double-Diploma Engineer/Master->Semester 9

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Date of update March 18, 2019

Grenoble INP Institut d'ingénierie Univ. Grenoble Alpes