Number of hours
- Lectures 6.0
- Projects 0
- Tutorials 6.0
- Internship 0
- Laboratory works 0
ECTS
ECTS 2.0
Goal(s)
Contact Bertrand LE GRATIET
Content(s)
1.Optical lithography:
1.1. Description of a standard scanner
1.2. Phenomenological description of image formation
1.3. Lithography criteria: Resolution, depth of focus, line edge roughness, ..
2. Trends in optical lithography: Resolution Enhancement Techniques:
2.1. Immersion Lithography
2.2. Double patterning
2.3. Optical Proximity effects Correction (OPC)
2.4. Advanced masks
3. Next Generation lithography:
3.1. Extreme UltraViolet (EUV)
3.2. Imprint
3.3. Directed Self Assembly
3.4. Direct electron beam writing
4. Focus on e-beam lithography technique (by Jonathan Pradelles, CEA-Leti)
4.1. e-beam writer description
4.2. Physics of electron/matter interaction
4.3. OPC in e-beam lithography
Prerequisites
Test
Semester 8 - The exam is given in english only 
100% exam écrit
Additional Information
Semester 8 - This course is given in english only
Course list
Curriculum->NANOTECH->Semester 8