Advanced lithography - 4PMTADL2

1.Optical lithography:
1.1. Description of a standard scanner
1.2. Phenomenological description of image formation
1.3. Lithography criteria: Resolution, depth of focus, line edge roughness, ..
2. Trends in optical lithography: Resolution Enhancement Techniques:
2.1. Immersion Lithography
2.2. Double patterning
2.3. Optical Proximity effects Correction (OPC)
2.4. Advanced masks
3. Next Generation lithography:
3.1. Extreme UltraViolet (EUV)
3.2. Imprint
3.3. Directed Self Assembly
3.4. Direct electron beam writing
4. Focus on e-beam lithography technique (by Jonathan Pradelles, CEA-Leti)
4.1. e-beam writer description
4.2. Physics of electron/matter interaction
4.3. OPC in e-beam lithography

Semester 8 - The exam is given in english only 

Contrôle continue : CC
Examen écrit Session1 : DS1
Examen écrit Session 2 : DS2
N1 = Note finale session 1
N2 = Note finale session 2

En présentiel :
N1 = % max(TdE, CC) + % DS1
N2 = % max(TdE, CC) + % DS2

En distanciel :
N1 =
N2 =

Commentaire :

Semester 8 - This course is given in english only