Number of hours
- Lectures 4.0
- Projects 0
- Tutorials 4.0
- Internship 0
- Laboratory works 24.0
- Written tests 0
ECTS
ECTS 2.0
Goal(s)
This course aims to familiarize students with technological operations as well as the physical modeling of the various physical phenomena occurring during the development of integrated circuits (NMOS sector), in connection with the clean room and electrical characterization labs.
Contact Panagiota MORFOULI, Irina IONICAContent(s)
Introduction of CMOS integration and clean room; thermal treatments; deposits (CVD, sputtering, evaporation, etc.); doping (ion implantation, diffusion); lithography; etching; process integration.
Practical work in clean room
Electrical characterization of different active components (MOS capacitors, transistors, diodes, etc.)
Prerequisites
For the lecture:
- session 1: written homework
- session 2: written homework
For the labs: written reports
note finale = 1/5 DM + 2/5 CR salle blanche +2/5 CR carac elec
• S.M. Sze : Semiconductor devices: Physics and Technology (2nd Ed., J. Wiley, 2002).