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School of engineering in Physics, Applied Physics, Electronics & Materials
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Our engineering & Master degrees
Our engineering & Master degrees

> Studies

Lithography - 5PMNPHO1

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  • Number of hours

    • Lectures : 5.0
    • Tutorials : 5.0
    • Laboratory works : 0
    • Projects : 0
    • Internship : 0
    ECTS : 1.0

Goals

The objective of this lecture is to show an over-view of the lithography techniques used in micro-electronics industry today. Some advanced solutions for the fabrication of the future devices are also discussed.

Contact Irina IONICA

Content

  • Introduction to lithography (definitions, objectives, classifications ...)
  • Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
    - Introduction to advanced lithography techniques (e-beam, nano-imprint)


Prerequisites

some concepts of microelectronics fabrication technology

Tests

If done in person : closed-book written exam, 1 hour
Else, 30 minutes on-line test



Additional Information

Curriculum->Double-Diploma Engineer/Master->Semester 9
Curriculum->Engineering degree->Semester 9

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Université Grenoble Alpes