Number of hours
- Lectures 5.0
- Projects 0
- Tutorials 5.0
- Internship 0
- Laboratory works 0
ECTS
ECTS 1.0
Goal(s)
The objective of this lecture is to show an over-view of the lithography techniques, in particular the photolithography, as the technique used in micro-electronics industry today. A reflection on sustainable development challenges around photolithography is also included.
Contact Lionel BASTARD, Irina IONICAContent(s)
- Introduction to lithography & miniaturisation
- Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
- Some sustainable development issues in photolithography
- Introduction to advanced lithography techniques (e-beam, nano-imprint)
Prerequisites
some concepts of microelectronics fabrication technology & photolithography
Test
Semester 9 - The exam is given in english only 
In-class SESSION1: Final supervised exam 90% + intermediate work 10%
Type of assessment: Supervised exam (on Chamilo, in an informatics room)
Duration: 30 min
Modalities: All documents are forbidden.
Calculator: allowed
In-class SESSION2: written exam of 30minutes, without documents; the intermediate work grade remains the same as in session 1
Lockdown conditions, session 1: same as in-class, with the exam on-line and on-line supervision (zoom).
Lockdown conditions, session 2: same as in-class, with the exam on-line and on-line supervision (zoom).
session 1 condition normale : 100% DS
session 2 condition normale : 100% DS rattrapage
session 1 condition confinement : mêmes qu’en présentiel
session 2 condition confinement : mêmes qu’en présentiel
Additional Information
Semester 9 - This course is given in english only
Course list
Curriculum->Double-Diploma Engineer/Master->Semester 9
Curriculum->IPhy->Semester 9