Phelma Formation 2022

Lithography - 5PMNPHO1

  • Number of hours

    • Lectures 5.0
    • Projects 0
    • Tutorials 5.0
    • Internship 0
    • Laboratory works 0

    ECTS

    ECTS 1.0

Goal(s)

The objective of this lecture is to show an over-view of the lithography techniques, in particular the photolithography, as the technique used in micro-electronics industry today. A reflection on sustainable development challenges around photolithography is also included.

Contact Irina IONICA

Content(s)

  • Introduction to lithography & miniaturisation
  • Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
  • Some sustainable development issues in photolithography
    - Introduction to advanced lithography techniques (e-beam, nano-imprint)


Prerequisites

some concepts of microelectronics fabrication technology & photolithography

Test

Semester 9 - The exam is given in english only 

In-class SESSION1: Final supervised exam 90% + intermediate work 10%

Type of assessment: Supervised exam (on Chamilo, in an informatics room)
Duration: 30 min
Modalities: All documents are forbidden.
Calculator: allowed

In-class SESSION2: written exam of 30minutes, without documents; the intermediate work grade remains the same as in session 1

Lockdown conditions, session 1: same as in-class, with the exam on-line and on-line supervision (zoom).
Lockdown conditions, session 2: same as in-class, with the exam on-line and on-line supervision (zoom).



session 1 condition normale : 100% DS
session 2 condition normale : 100% DS rattrapage

session 1 condition confinement : mêmes qu’en présentiel
session 2 condition confinement : mêmes qu’en présentiel

Additional Information

Semester 9 - This course is given in english only EN

Course list
Curriculum->Double-Diploma Engineer/Master->Semester 9
Curriculum->IPhy->Semester 9