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Photolithography - 5PMNPHO1

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Number of hours
- Lectures : 5.0
- Tutorials : 5.0
ECTS : 1.0

Goals

The objective of this lecture is to show an over-view of the lithography techniques used in micro-electronics industry today. Some advanced solutions for the fabrication of the future devices are also discussed.

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Content

Introduction to lithography (definitions, objectives, classifications ...)
Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
- Introduction to advanced lithography techniques (e-beam, nano-imprint)

Prerequisites

some concepts of microelectronics fabrication technology

Tests

closed-book written exam, 1 hour

Additional Information

Course list

Curriculum->Master PhSem->Semester 9

Curriculum->PNS->Semester 9

Curriculum->Double-Diploma Engineer/Master->Semester 9

Curriculum->Master->Semester 9

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