Lithography - 5PMNPHO1
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Number of hours
- Lectures : 5.0
- Tutorials : 5.0
- Laboratory works : 0
- Projects : 0
- Internship : 0
ECTS : 1.0
Goals
The objective of this lecture is to show an over-view of the lithography techniques used in micro-electronics industry today. Some advanced solutions for the fabrication of the future devices are also discussed.
Contact Irina IONICA
Content - Introduction to lithography (definitions, objectives, classifications ...)
- Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
- Introduction to advanced lithography techniques (e-beam, nano-imprint)
Prerequisitessome concepts of microelectronics fabrication technology
Tests If done in person : closed-book written exam, 1 hour
Else, 30 minutes on-line test
Additional Information Curriculum->Double-Diploma Engineer/Master->Semester 9
Curriculum->Engineering degree->Semester 9
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