Phelma Formation 2022

Lithography - 5PMNPHO1

  • Number of hours

    • Lectures 5.0
    • Projects 0
    • Tutorials 5.0
    • Internship 0
    • Laboratory works 0

    ECTS

    ECTS 1.0

Goal(s)

The objective of this lecture is to show an over-view of the lithography techniques used in micro-electronics industry today. Some advanced solutions for the fabrication of the future devices are also discussed.

Contact Irina IONICA

Content(s)

  • Introduction to lithography (definitions, objectives, classifications ...)
  • Optical lithography (steps, exposition and alignment systems, optics for lithography, resolution enhancement techniques, immersion lithography, extreme-UV lithography…)
    - Introduction to advanced lithography techniques (e-beam, nano-imprint)


Prerequisites

some concepts of microelectronics fabrication technology

Test

30 minutes test or written exam



100% écrit

Additional Information

Course list
Curriculum->Engineering degree->Semester 9
Curriculum->Double-Diploma Engineer/Master->Semester 9